U.S. and Japan Drive Government-Supported EUV Initiative While South Korea Allegedly Falls Behind

Posted in

July 2, 2025

U.S. and Japan Drive Government-Supported EUV Initiative While South Korea Allegedly Falls Behind

The U.S. and Japan are advancing their efforts to implement extreme ultraviolet (EUV) lithography equipment through government-led initiatives, as outlined by South Korean media source ETNews. The U.S. National Semiconductor Technology Center (NSTC) has installed EUV tools at the Albany Nanotech Complex, set to offer services starting July 2025, with plans for a High-NA EUV machine by 2026. Meanwhile, Japan is constructing an R&D facility for EUV equipment, aiming for operation in 2027. In contrast, South Korea is lagging behind; its plans for a “Korean version of imec” have stalled, and the ongoing “mini fab” project in Yongin will utilize argon fluoride immersion equipment instead of EUV tools.

Original source:

https://www.trendforce.com/news/2025/07/02/news-u-s-japan-lead-government-backed-euv-push-as-south-korea-reportedly-lags/

U.S. and Japan Drive Government-Supported EUV Initiative While South Korea Allegedly Falls Behind

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