Breakthrough in Deep UV Micro-LED Display Chips Paves the Way for Maskless Photolithography

Research from the Hong Kong University of Science and Technology (HKUST) has unveiled the world’s first deep ultraviolet (DUV) micro-LED display array for use in lithography machines, a significant advancement for the semiconductor manufacturing industry. This innovative micro-LED technology, a collaboration with the Southern University of Science and Technology and the Suzhou Institute of Nanotechnology, enhances the efficiency of maskless photolithography by providing high light output power density, which reduces exposure time for photoresist films. Traditional lithography methods face limitations such as size, energy consumption, and low resolution, but the new DUV micro-LED device overcomes these hurdles with improved optical performance and customization capabilities. Researchers anticipate further developments in quantum efficiency and resolution, paving the way for high-resolution DUV displays. The findings were published in Nature Photonics.

Breakthrough in Deep UV Micro-LED Display Chips Paves the Way for Maskless Photolithography

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