China Makes Significant Advances in EUV Technology for Chip Production

Chinese researchers have made significant strides in semiconductor technology by developing an extreme ultraviolet (EUV) light source platform with competitive capabilities, as reported by the South China Morning Post. Led by Lin Nan, a former ASML engineer, the team from the Shanghai Institute of Optics and Fine Mechanics created a solid-state laser-driven EUV light source that shows promising efficiency and compactness compared to traditional CO2 lasers. Despite facing restrictions from US export controls on advanced manufacturing technologies to China, the experimental platform achieved a conversion efficiency of 3.42%, surpassing previous international records and contributing to China’s ambitions in advancing EUV photolithography technology. The platform aims to localize critical components for the semiconductor industry, offering a viable alternative to existing CO2 laser systems.

China Makes Significant Advances in EUV Technology for Chip Production

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