Chinese Innovator Lin Nan Leads Major Breakthrough in EUV Technology

Chinese researchers have made a significant advancement in the domestic production of advanced chips by developing a competitive extreme ultraviolet (EUV) light source platform, as detailed in a recent research paper. Led by Lin Nan, a former head of light source technology at the Dutch company ASML, the team from the Shanghai Institute of Optics and Fine Mechanics aims to bypass trade restrictions that have prevented China from acquiring the most sophisticated EUV machines since 2019. ASML’s CEO Christophe Fouquet previously indicated that while generating EUV light is feasible, it would take years for China to produce a machine independently. Lin, who returned to China in 2021 as part of a talent recruitment initiative, founded the advanced photolithography technology research group behind this breakthrough and has benefited from mentoring by notable physicist Anne L’Huillier, a recent Nobel Prize winner.

Chinese Innovator Lin Nan Leads Major Breakthrough in EUV Technology

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